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New Submicron Silica Produced by the Fumed Process

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Submicron silicas produced by fumed processes and their corresponding surface-modified counterparts are compared with respect to their applicability as external additives for electrophotographic toners. The principal metric for comparison is tribo-electrostatic charge (T-ESC) stability under extended activation periods. Experimental samples are surface-modified submicron silicas produced by a fumed process. These materials have sufficient hydrophobicity and can work as spacer particles to prevent the embedding of small particle size external additives. This spacer-attribute thereby eliminates problems with charge stability and flowability, especially under extreme environmental conditions, that can impact toner performance.
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Document Type: Research Article

Publication date: January 1, 2012

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  • For more than 30 years, IS&T's series of digital printing conferences have been the leading forum for discussion of advances and new directions in 2D and 3D printing technologies. A comprehensive, industry-wide conference that brings together industry and academia, this meeting includes all aspects of the hardware, materials, software, images, and applications associated with digital printing systems?particularly those involved with additive manufacturing and fabrication?including bio-printing, printed electronics, page-wide, drop-on-demand, desktop and continuous ink jet, toner-based systems, and production digital printing, as well as the engineering capability, optimization, and science involved in these fields. In 2016, the conference changed its name formally to Printing for Fabrication to better reflect the content of the meeting and the evolving technology of printing.

    Please note: For purposes of its Digital Library content, IS&T defines Open Access as papers that will be downloadable in their entirety for free in perpetuity. Copyright restrictions on papers vary; see individual paper for details.

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