Pitch Shifts in Post-Stimulatory Masking

The pitch shift of 30 ms tone pulses at 20 phon level was investigated in the region of highpass noise 80 phon level post-stimulatory masking.

Four highly trained music students served as subjects in the experiment. A method of matchings (adjustments) was used and a semi-random distribution of pulse frequencies within ± 6% of the masker cut-off. The results were then classified into two groups i.e. above and below the masker cut-off and computed separately. The analysis covers over 2600 pitch matchings.

The pitch shift in the region of post-stimulatory masking is discussed in terms of possible changes in the excitation pattern.