Structure and Mechanical Properties of (AlCrNbSiTiV)N Thin Films Deposited Using Reactive Direct Current Magnetron Sputtering
High quality (AlCrNbSiTiV)N high entropy alloy nitride thin films are prepared using reactive direct current (dc) magnetron sputtering. The effect of substrate bias (from 0 to –200 V) on the microstructure, mechanical properties and the performance of cutting tools that are coated with the (AlCrNbSiTiV)N films were investigated. The microstructures are characterized using transmission electron microscopy, scanning electron microscopy and nano-indentation techniques. This study deposited (AlCrNbSiTiV)N film with a thickness of 469.9∼366.2 nm. It is found that the films are homogeneous and very compact and that they adhere perfectly to the substrate, and the Rockwell indentation results belong to HF1. The coated films are studied using scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM), and a nanoindenter. As the substrate bias is increased from 0 V to –100 V, the elastic recovery and the hardness of the (AlCrNbSiTiV)N film increases, but further increases in the substrate bias voltage results in a decrease in these values. After dry turning using a cermet cutter inserts that is coated in a (AlCrNbSiTiV)N film, the surface roughness of the work-piece and the flank wear for a cermet cutter are significantly reduced.
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Document Type: Research Article
Publication date: September 1, 2018
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