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Characterization of TiO x Thin Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition for Hard-Mask Applications in Semiconductor Devices

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Titanium oxide (TiO x ) thin films were fabricated by plasma-enhanced chemical vapor deposition using titanium tetraisopropoxide (TTIP) and cyclohexane (CHex) precursors. The films fabricated using a single precursor of TTIP at deposition temperatures of 400 °C and 500 °C showed polycrystalline structure with anatase and/or rutile phases. The TiO x films fabricated using mixed precursors of TTIP and CHex at temperatures in the range of 300–500 °C, and those fabricated using the single TTIP precursor at 300 °C showed amorphous structures. For the films fabricated using the single TTIP precursor, the O/Ti ratios were in the range of 1.72–1.75. Higher content of carbon (83–91 at%) and O/Ti ratios in the range of 1.31–1.83 were observed for the films fabricated using mixed precursors. Ti2p, O1s, and C1s peaks were analyzed using X-ray photoelectron spectroscopy. Fourier-transform infrared spectroscopy measurements showed that the Ti–O stretching vibration peak was primarily observed in the film fabricated using the single TTIP precursor; it had a lower intensity for the films fabricated using mixed precursors. Dry-etching showed that the TiO x film fabricated using the TTIP single precursor, deposited at 400 °C, had a high etch selectivity of 9.9 over SiO2, which demonstrates its potential for application as a hard-mask material.
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Keywords: FOURIER-TRANSFORM INFRARED SPECTROSCOPY; HARD-MASK; TITANIUM OXIDE; X-RAY PHOTOELECTRON SPECTROSCOPY

Document Type: Research Article

Publication date: July 1, 2018

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  • Science of Advanced Materials (SAM) is an interdisciplinary peer-reviewed journal consolidating research activities in all aspects of advanced materials in the fields of science, engineering and medicine into a single and unique reference source. SAM provides the means for materials scientists, chemists, physicists, biologists, engineers, ceramicists, metallurgists, theoreticians and technocrats to publish original research articles as reviews with author's photo and short biography, full research articles and communications of important new scientific and technological findings, encompassing the fundamental and applied research in all latest aspects of advanced materials.
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