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Home / Science of Advanced Materials, Volume 9, Number 10

Plasma Reduction of Graphene Oxide in Atmospheric Pressure Glow Discharge

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Authors: Seo, Ho Seok; Lee, Won Gyu

Source: Science of Advanced Materials, Volume 9, Number 10, October 2017, pp. 1854-1858(5)

Publisher: American Scientific Publishers

DOI: https://doi.org/10.1166/sam.2017.3194

The reduction of graphene oxide (GO) was processed in an atmospheric pressure plasma discharge with several gas mixtures consisting of the combination of H2, Ar, N2 and CH4. Oxygen-containing functional groups on the surface of the graphene oxide were effectively and rapidly removed in the ambient atmosphere of H2 containing plasma discharge without artificial heating. An increase of the H2 concentration in the feed gas mixture, applied AC voltage, and process time generally enhanced the reducing efficiency of the graphene oxide. The atomic carbon concentration of 68.81% was changed to 89.34% in the H2/N2 plasma after 30 min. The result shows that the plasma treatment is a practical and effective method for the reduction of graphene oxide.

Keywords: ATMOSPHERIC PRESSURE PLASMA DISCHARGE; GRAPHENE OXIDE; OXYGEN-CONTAINING FUNCTIONAL GROUP; REDUCTION PROCESS

Document Type: Research Article

Publication date: 01 October 2017

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  • Science of Advanced Materials (SAM) is an interdisciplinary peer-reviewed journal consolidating research activities in all aspects of advanced materials in the fields of science, engineering and medicine into a single and unique reference source. SAM provides the means for materials scientists, chemists, physicists, biologists, engineers, ceramicists, metallurgists, theoreticians and technocrats to publish original research articles as reviews with author's photo and short biography, full research articles and communications of important new scientific and technological findings, encompassing the fundamental and applied research in all latest aspects of advanced materials.
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