Effect of the Chlorine Ion on Wet Etching of Molybdenum Tantalum Alloy Thin Film in Phosphoric Acid Solution
In this research paper, the effect of chlorine ion on the electrochemical behaviors of Mo-6 at% Ta alloy thin films was investigated. As the concentration of chlorine ions in the phosphoric acid mixture increased from 0 wt% to 2 wt%, the measured corrosion current density also increased from 3 mA/cm2 to 10 mA/cm2, indicating that the chlorine ion induces passivity breakdown of the molybdenum tantalum alloy. The empirical equation for Mo-6 at% Ta dissolution was also obtained. The dissolution mechanism of Mo-6 at% Ta in acidic solution containing chlorine ion was suggested. In addition, the electrochemical impedance spectroscopy was compared with that of pure tantalum thin film.
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Document Type: Research Article
Publication date: April 1, 2016
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