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Transparent Conductive and Wide Band Gap Characteristics of Quaternary Mg and Al Co-Doped ZnO Thin Films Prepared by Radio Frequency Sputtering Method

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Highly transparent, conducting Mg and Al co-doped ZnO (MAZO) thin films were deposited on glass substrates by a radio frequency (RF) magnetron sputtering technique. Evolution of structural, morphological and optical properties of MAZO thin films with different RF sputtering power (from 75 to 175 W) has been investigated. The X-ray diffraction pattern reveals the single growth phase of the thin films having a hexagonal wurtzite structure crystallized along a c-axis as its preferred orientation. A relatively smooth surface morphology and increased film thickness was observed when the RF sputtering power was increased. An increase in the peak intensity for the (0002) diffraction plane was also observed in the film deposited with increased sputtering power. Excellent electrical and optical properties in terms of the carrier concentration (1.87 × 1020 cm–3), charge carrier mobility (35.04 cm2V–1S–1), minimum resistivity (9.48 × 10–4 Ωcm), widest band gap energy (∼3.79 eV) and average transmittance over 80% were obtained in MAZO films deposited with an RF power of 150 W. This investigation provides key information regarding the optimization of RF sputtering power to prepare the best quality transparent conducting oxides.
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Document Type: Research Article

Publication date: March 1, 2016

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  • Science of Advanced Materials (SAM) is an interdisciplinary peer-reviewed journal consolidating research activities in all aspects of advanced materials in the fields of science, engineering and medicine into a single and unique reference source. SAM provides the means for materials scientists, chemists, physicists, biologists, engineers, ceramicists, metallurgists, theoreticians and technocrats to publish original research articles as reviews with author's photo and short biography, full research articles and communications of important new scientific and technological findings, encompassing the fundamental and applied research in all latest aspects of advanced materials.
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