Application of a Single Segment Target to Synthesize the Multicomponent Cr-Based Thin Films and Their Characterization
Using a segment target has several advantages. For instance, it is theoretically possible to deposit almost any material to synthesize various multicomponent films without much difficulty. In this work, CrZr–Si–N films with various Si contents were synthesized by using an unbalanced magnetron sputtering process with a single Cr– Zr–Si segment target. Three segment target types with various volume ratios of (Cr+Zr):Si (each volume ratios is 11:1, 5:1 and 3:1) were used in this work. Characteristics such as the crystalline structure, surface morphology, hardness and chemical composition as a function of the Si content were investigated. Results showed that the multicomponent Cr-based thin films could be successfully synthesized by using a single segment target and the thin films had a dense and compact microstructure and a very smooth surface. Moreover, the surface roughness decreased as the Si content in the films increased. The microstructure of the thin films consisted of a mainly crystalline Cr(Zr)N phase and amorphous Si3N4 phase. The maximum hardness and elastic modulus of the films were measured to be approximately 32.7 GPa and 253.1 GPa, respectively. However, the increase in the Si content in the films induced decreases in the hardness and elastic modulus of the films.
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Document Type: Research Article
Publication date: January 1, 2015
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