Electrical, Optical and Structural Properties of AZO Thin Film Deposited Using Facing Targets Magnetron Sputtering System with Inductively Coupled Plasma
Magnetron sputtering is used widely in industrial coating for architectural glass (low emissivity coatings), integrated circuits (metal films), flat panel displays (TCO films), and hard coatings (titanium nitride). There is still a needs for further research on the technique. ZnO:Al (AZO) thin films have been deposited on glass substrates using a low plasma damage facing target sputtering (FTS) system with inductively coupled plasma (ICP) at low processing temperatures. In this study, a FTS system was adopted, in which the substrate was much less thermally damaged by impinging high-energy particles due to a confining magnetic field between two facing magnetron sources. A coil antenna was configured to add inductive coupling components. The structural, electrical, and optical properties of the deposited films were investigated as a function of ICP power. All the samples had a highly preferred orientation of the c-axis, perpendicular to the glass substrate. The sheet resistance of the films showed a decreasing trend with increase ICP power. The lowest value, of 25.03 Ω/〈 was obtained at the highest ICP power. In the optical property analysis, the transmittance was above 86% and the optical band gaps varied between 3.65 and 3.8 eV with ICP power changes. To monitor process conditions, substrate temperature change was monitored and optical emission spectroscopy (OES) was performed. The intensity ratio of Zn (307.2 nm) to Ar (811.5 nm) showed a correlation with the deposition rate with the change in ICP power.
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Document Type: Research Article
Publication date: January 1, 2015
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