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The Structure and Photoelectrochemistry of Al, Ti Co-Doped Zinc Oxide Thin Films Prepared by Sol–Gel Dip-Coating Process

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Al, Ti co-doped ZnO (ATZO) thin films were prepared on glass substrate via sol–gel dip-coating process. Importantly, we replaced the toxic 2-methoxy-ethanol by nontoxic ethanol as a much safer reagent. The dip-coating was repeated four times and as-obtained thin films were then annealed at 500 °C for 1 h in air. We found that introducing Al and Ti dopant would transfer the principal diffraction peak from (101) to (002), decrease the vibration strength of E 2 high and E 1 LO, lead a relative smoother surface, blueshift the band gap, decrease resistance and increase photocurrent density. Also, doping Al and Ti arose the open circuit potential and as a result, increased the anti-correction of ATZO films.
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Keywords: AL; ATZO; PHOTOELECTROCHEMISTRY; TI; WATER SPLITTING; ZNO

Document Type: Short Communication

Publication date: March 1, 2014

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  • Nanoscience and Nanotechnology Letters (NNL) is a multidisciplinary peer-reviewed journal consolidating nanoscale research activities in all disciplines of science, engineering and medicine into a single and unique reference source. NNL provides the means for scientists, engineers, medical experts and technocrats to publish original short research articles as communications/letters of important new scientific and technological findings, encompassing the fundamental and applied research in all disciplines of the physical sciences, engineering and medicine.
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