The Structure and Photoelectrochemistry of Al, Ti Co-Doped Zinc Oxide Thin Films Prepared by Sol–Gel Dip-Coating Process
Al, Ti co-doped ZnO (ATZO) thin films were prepared on glass substrate via sol–gel dip-coating process. Importantly, we replaced the toxic 2-methoxy-ethanol by nontoxic ethanol as a much safer reagent. The dip-coating was repeated four times and as-obtained thin films were then annealed at 500 °C for 1 h in air. We found that introducing Al and Ti dopant would transfer the principal diffraction peak from (101) to (002), decrease the vibration strength of E 2 high and E 1 LO, lead a relative smoother surface, blueshift the band gap, decrease resistance and increase photocurrent density. Also, doping Al and Ti arose the open circuit potential and as a result, increased the anti-correction of ATZO films.
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Document Type: Short Communication
Publication date: March 1, 2014
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