Influence of Sputtering Target Power on Microstructure and Mechanical Properties of W-N and Ta-N Coatings
W-N and Ta-N coatings were manufactured using r.f. reactive magnetron sputtering technique in mixed atmosphere of Ar + N2. The effect of sputtering power on the microstructure and mechanical properties of these coatings has been investigated. It was found that increasing sputtering power induced structure transformation of W-N and Ta-N coatings from hexagonal WN to fcc β-W2N and from fcc TaN through a mixture of orthorhombic Ta3N5 and fcc TaN to orthorhombic Ta3N5, respectively. The increase in sputtering power led to grain refinement which played a major role in hardness enhancement. At the highest sputtering power of 100W, the average grain size of Ta-N and W-N coatings reduced to minimum value of 7 nm and 21 nm, correspondingly the hardness reached maximum value of 29 GPa and 31 GPa, respectively. However, Ta-N and W-N coatings possessed the biggest adhesion strength of ∼41 N and ∼48 N at the lowest sputtering power of 40 W and 25 W, respectively.
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Document Type: Short Communication
Publication date: June 1, 2012
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