Preparation of Visible-Light-Active Photocatalysts Having Cu-Contained Layer by Plasma CVD
TiO2 film covered with Cu-contained layer is prepared by plasma CVD using copper(II) acetylacetonate gas and then heat-treated at 473 K in air. A surface layer of the plasma CVD-treated TiO2 film is composed of Cu, C, and O atoms and shows visible light absorption. The plasma CVD-treated TiO2 film can decompose 2-propanol into acetone and CO2 under visible light irradiation. Such visible light activity of the plasma CVD-treated TiO2 film becomes remarkably after the heat treatment. It is confirmed from XPS analysis that carbon-doping does not take place with the plasma CVD and the heat treatment and the origin of the visible light activity is not carbon-doping in the plasma CVD-treated TiO2 film. Carbon content in the plasma-CVD layer is decreased by the heat treatment, whereas copper content is increased. It is assumed that photo-excited electron reduces directly Cu(II) contained in the surface layer via an interfacial charge transfer and the resulting Cu(I) can reduce O2 with two and four electrons to appear visible light activity.
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Document Type: Short Communication
Publication date: June 1, 2012
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