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High Transparent Titanium Dioxide-Anatase Thin Films Deposited by Spin Coating Technique: Effect of Annealing Temperature

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TiO2 thin films were deposited on microscopic glass (HiLab) substrate by spin coating technique. The influence of the annealing temperature on the structural, optical and electrical properties was studied. X-ray diffraction and Fourier transform-infrared absorbance were used to determine the films structural properties, UV-Vis spectroscopy and photoluminescence to investigate the optical proprieties of thin films and two-point probe method to study the electrical conductivity. Structural analysis show that the films have tetragonal structure of anatase with a preferred growth orientation along the (101) plane and the crystallite size increased from 24 nm at 400 °C to 81 nm at 600 °C where the deformation was changed inversely indicating the films crystallinity improvement. The films have a high transmittance in the visible region reach to 90% and the direct and indirect band gaps exhibit a little decrement with annealing temperature. Furthermore, the films have a low electrical conductivity.
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Keywords: ANNEALING TEMPERATURE; OPTICAL PROPERTIES; SPIN COATING; STRUCTURAL PROPERTIES; THIN FILMS; TITANIUM DIOXIDE

Document Type: Research Article

Publication date: September 1, 2018

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  • Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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