TiO2 Grown by Pulsed Laser Deposition and Reactive DC Direct Current Sputtering as an Intermediate Buffer Layer in Photovoltaic Structures
TiO2 thin films deposited on glass and silicon were obtained using a direct current magnetron sputtering technique and pulsed laser deposition using a modular deposition platform. The sample properties were determined by scanning electron microscopy (SEM) and X-ray diffraction analysis. Basic material properties, such as thickness, layer structure, and optical properties, were also examined. The obtained films had a nanocrystalline structure with a mean grain diameter ranging from 0.2 to 0.4 m. This article presents a detailed discussion of the influence of the manufacturing technique on TiO2 thin film morphology and optical properties for possible photovoltaic applications for polycrystalline heterostructures.
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Document Type: Research Article
Publication date: July 1, 2018
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- Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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