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TiO2 Grown by Pulsed Laser Deposition and Reactive DC Direct Current Sputtering as an Intermediate Buffer Layer in Photovoltaic Structures

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TiO2 thin films deposited on glass and silicon were obtained using a direct current magnetron sputtering technique and pulsed laser deposition using a modular deposition platform. The sample properties were determined by scanning electron microscopy (SEM) and X-ray diffraction analysis. Basic material properties, such as thickness, layer structure, and optical properties, were also examined. The obtained films had a nanocrystalline structure with a mean grain diameter ranging from 0.2 to 0.4 m. This article presents a detailed discussion of the influence of the manufacturing technique on TiO2 thin film morphology and optical properties for possible photovoltaic applications for polycrystalline heterostructures.
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Keywords: MORPHOLOGIC PROPERTIES; OPTICAL PROPERTIES; PULSED LASER DEPOSITION (PLD); REACTIVE DIRECT CURRENT (DC) SPUTTERING; TIO2 THIN FILMS

Document Type: Research Article

Publication date: July 1, 2018

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  • Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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