Nanofluidics devices with two-dimensional nano-structures have attracted extensive interests for biological and chemical applications. The fabrication of nanoscale mask patterns with controllable line width is an indispensable process for manufacturing two-dimensional nano-structures.
However, a simple and low-cost method for fabricating two-dimensional nano-patterns is still a challenge. In this work, a novel simple and low-cost method for fabricating nanoscale mask patterns with controllable line width, based on the ultraviolet exposure is presented. In the experiment,
a layer of AZ5214 reversal photoresist was exposed to the ultraviolet light through the photomask with microscale patterns. After the lithography, nanoscale photoresist mesas patterns instead of microscale patterns were produced. The photoresist mesas with 400~800 nm width were fabricated.
Meanwhile, by adjusting the parameters of exposure time, various nanoscale dimensions of photoresist mesas can be obtained. The proposed method overcomes limitations of the conventional ultraviolet lithography technology without the need to the expensive nanolithography equipment. Our novel
fabrication method should be a useful tool for two-dimensional nano-structures fabrication due to its advantages of simple fabrication process, well controllability, and low-cost.
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Document Type: Research Article
School of Mechanical Engineering, Hebei University of Technology, Tianjin 300401, China
College of Packaging and Printing Engineering, Tianjin University of Science and Technology, Tianjin 300222, China
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian 116024, China
Publication date: April 1, 2020
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Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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