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Electrochemical Polishing of Cu Redistribution Layers for Fan-Out Wafer Level Packaging

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Cu overburden layers on the trenches from redistribution layer process of fan-out wafer level packaging were successfully polished by electrochemical polishing method. For the uniform electrochemical polishing of Cu overburden on inside and outside of the trenches, thickness of the Cu overburden was controlled to have same thickness at the both side of trenches by addition of the additives such as accelerator, suppressor, and leveler. Before the electrochemical polishing of Cu overburden, optimum polishing potential and polishing rates were determined to 1.3 V and 462 nm/C ยท cm−2 through the cyclic voltammetry analysis and observation of electrochemical polishing behavior of Cu planar substrate in 85% H3PO4. Electrochemical polishing of Cu overburden was carried out at the condition determined from the previous experiment. The results of electrochemical polishing indicated that Cu overburden on both side of trenches was totally removed simultaneously at the end of electrochemical polishing and Cu overburden profile was important for the uniform planarization of Cu overburden on both side of the trenches.
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Keywords: ECP; Electrochemical Polishing; Electropolishing; FOWLP; Trench Filling

Document Type: Research Article

Affiliations: 1: Department of Advanced Material Science & Engineering, Hanyang University, Ansan-si, Gyeonggi-do, 15588, Republic of Korea 2: Department of Material Science & Engineering, Hanyang University, Ansan-si, Gyeonggi-do, 15588, Republic of Korea

Publication date: October 1, 2019

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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