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Kossel Effect in Periodic Multilayers

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The Kossel effect is the diffraction by a periodically structured medium, of the characteristic X-ray radiation emitted by the atoms of the medium. We show that multilayers designed for X-ray optics applications are convenient periodic systems to use in order to produce the Kossel effect, modulating the intensity emitted by the sample in a narrow angular range defined by the Bragg angle. We also show that excitation can be done by using photons (X-rays), electrons or protons (or charged particles), under near normal or grazing incident geometries, which makes the method relatively easy to implement. The main constraint comes from the angular resolution necessary for the detection of the emitted radiation. This leads to small solid angles of detection and long acquisition times to collect data with sufficient statistical significance. Provided this difficulty is overcome, the comparison or fit of the experimental Kossel curves, i.e., the angular distributions of the intensity of an emitted radiation of one of the element of the periodic stack, with the simulated curves enables getting information on the depth distribution of the elements throughout the multilayer. Thus the same kind of information obtained from the more widespread method of X-ray standing wave induced fluorescence used to characterize stacks of nanometer period, can be obtained using the Kossel effect.
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Keywords: Bragg Diffraction; Interface; Kossel Effect; Multilayer; X-ray Fluorescence

Document Type: Research Article

Affiliations: 1: Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire de Chimie Physique – Matière et Rayonnement, boîte courrier 1140, 4 place JussieuF-75252 Paris cedex 05, France 2: Laboratoire Charles Fabry, Institut d’Optique GraduateSchool, CNRS, Université Paris-Saclay, 91127 Palaiseau Cedex, France 3: CNR, Istituto Officina Materiali 34149 Trieste, Italy 4: Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P. R. China 5: Shanghai Institute of Laser Plasma, Shanghai 201800, P. R. China 6: Jiangsu University of Science and Technology, School of Materials Science and Engineering, Mengxi Road 2, Zhenjiang, Jiangsu Province, 212003, P. R. China 7: Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Institut des NanoSciences de Paris, boîte courrier 840, 4 place Jussieu, F-75252 Paris cedex 05, France 8: Sorbonne Université, Faculté des Sciences et Ingénierie, UMR CNRS, Laboratoire d’Archeìologie Moleìculaire et Structurale (LAMS), boîte courrier 225, 4 place Jussieu, F-75005 Paris, France

Publication date: January 1, 2019

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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