TiAlSiN thin films exhibit high hardness due to the multicomponent and multiphase structures. Effects of Si on TiAlSiN microstructure and mechanical properties have been well studied. However, there is insufficient information on the effects of Al. Thus, in this work, Al-contained nanocomposite
nc-TiN/a-SiNx thin films with Al up to 10 at.% were prepared by magnetron co-sputtering Ti, Al and Si3N4 targets in Ar/N2 gas atmosphere. The effects of Al on TiAlSiN microstructure and mechanical property were well studied. Adjusting Al/(Ti+Al) target power ratio tuned chemical composition,
microstructure and consequently mechanical properties. With increase of Al/(Ti+Al) target power ratio from 0 to 0.2, Al content increased from 0 to 10 at.%. X-ray photoelectron spectroscope results showed that aluminum nitride was formed. X-ray diffraction results confirmed that the nanocrystalline
phase TiN was with Si and Al in its structure, or (Ti, Al, Si) N. The matrix was amorphous silicon nitride containing aluminum nitride. Nanoindentation hardness of the thin films remained at about 28 GPa till Al addition was increased to 3.1 at.%.
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Document Type: Research Article
School of Materials Science and Engineering, Chongqing University, Chongqing 400044, China
Material Corrosion and Protection Key Laboratory of Sichuan Province, Sichuan University of Science and Engineering, Zigong 643000, China
Faculty of Materials and Energy, Southwest University, Chongqing 400715, China
Publication date: January 1, 2019
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