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Fabrication of Three-Dimensional Single-Walled Carbon Nanotube Networks Suspended on Si Pillar Architecture

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We synthesized three-dimensional (3-D) SWNT networks suspended on Si pillar architecture. The pillar arrays on Si substrate were formed by a standard photolithography technique using a patterned chrome mask and plasma etching in a SF6:C4F8 gas mixture. Successively, 3-D SWNT networks were synthesized between pillar arrays by a thermal chemical vapor deposition. We investigated the optical properties and formation of 3-D SWNT networks suspended on Si pillar arrays through controlling catalyst deposition methods between pillar arrays by using scanning electron microscopy and Raman spectroscopy. We confirmed that the bridging and connecting of SWNTs between Si pillars, suggesting the effective growth of the 3-D SWNT networks on Si pillar architecture for application to large scale and well-organized devices.
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Keywords: Catalyst; Chemical Vapor Deposition; SWNT Networks; Si Pillar Architecture

Document Type: Research Article

Affiliations: 1: The Research Institute for Natural Sciences and Department of Chemistry, Hanyang University, Haengdang-dong 17, Seongdong-gu, Seoul, Korea 2: Center for Advanced Instrumentation, Korea Research Institute of Standards and Science, Daejeon 34113, Korea

Publication date: August 1, 2017

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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