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Ferroelectric Random Access Memories

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Ferroelectric random access memory (FeRAM) is a nonvolatile memory, in which data are stored using hysteretic P–E (polarization vs. electric field) characteristics in a ferroelectric film. In this review, history and characteristics of FeRAMs are first introduced. It is described that there are two types of FeRAMs, capacitor-type and FET-type, and that only the capacitor-type FeRAM is now commercially available. In chapter 2, properties of ferroelectric films are discussed from a viewpoint of FeRAM application, in which particular attention is paid to those of Pb(Zr,Ti)O3, SrBi2Ta2O9, and BiFeO3. Then, cell structures and operation principle of the capacitor-type FeRAMs are discussed in chapter 3. It is described that the stacked technology of ferroelectric capacitors and development of new materials with large remanent polarization are important for fabricating high-density memories. Finally, in chapter 4, the optimized gate structure in ferroelectric-gate field-effect transistors is discussed and experimental results showing excellent data retention characteristics are presented.

Document Type: Research Article

Publication date: 01 October 2012

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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