R.F. Magnetron Sputtering of Multilayered c-BN Films on Cemented Carbide Tool
A c-BN thin film was deposited using a B4C target in a r.f. magnetron sputtering system. The c-BN layer was coated with a TiAlN adhesion layer (∼2 μm), boron carbide (∼1 μm) and BCN (10∼15 nm) nano-gradient layer system. The c-BN layers with thicknesses of more than 0.5 μm were successfully deposited onto cemented carbide substrates. The high resolution XPS spectra analysis of B1s and N1s revealed that the c-BN film was mainly composed of sp3 BN bonds.
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Document Type: Research Article
Publication date: February 1, 2011
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