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On Prognosis of Technological Process to Optimize Manufacturing of an Invertors to Increase Density Their of Elements

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In this paper we analyzed possibility to increase density of elements in circuit of an inverter based on field-effect heterotransistors. We introduce an approach to increase density of the considered elements. The approach based on manufacture a heterostructure with specific configuration, doping of required areas of the heterostructure by diffusion or ion implantation and optimization of annealing of dopant and/or radiation defects. We compare manufacturing of these transistors, manufactured by diffusion and ion implantation.
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Keywords: ANALYTICAL APPROACH FOR PROGNOSIS; INCREASING OF DENSITY OF FIELD-EFFECT HETEROTRANSISTORS; INVERTER; OPTIMIZATION OF MANUFACTURING

Document Type: Research Article

Publication date: December 1, 2016

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  • Journal of Nanoengineering and Nanomanufacturing is a multidisciplinary peer-reviewed international journal consolidating research activities in all experimental and theoretical aspects of nanoscale engineering and manufacturing science into a single and unique reference source. The main aim of this journal is to provide an international forum for scientists, engineers, researchers, and academicians working in the field of nanoscale science and engineering, nanomanufacturing science, processing technology and applications.
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