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Raman Spectrum Stress Model of the Uniaxial/Biaxial Strained Ge Materials

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The stress of the strained Ge material can be characterized by Raman spectroscopy. The position of Raman spectral peak of strained Ge material are related to factors such as: the magnitude of stress, the types of stress and the crystal face which be stressed. However there is still lack of the relevant reports. Based on the principle of Raman spectrum, the Secular equation and the Raman selection rule, the relationship between the Raman spectral shift and the strain tensor of uniaxial and biaxial (001), (101), (111) strained Ge material can be obtained. And then, we can establish the theoretical model of the relationship between the stress and the position of Raman spectral peak of the (001), (101), (111) uniaxial and biaxial strained Ge material depending on the Hooke’s law. So this paper provides an important theoretical reference for the test and analysis of strained Ge material stress.

Keywords: Raman; Strained Ge; Stress

Document Type: Research Article

Affiliations: 1: Hebei Poshing Electronics Technology Co., Ltd. Shi JiaZhuang, 050200, P. R. China 2: School of Microelectronics, Xidian University, Xi’an, 710071, P. R. China

Publication date: 01 December 2015

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  • Journal of Computational and Theoretical Nanoscience is an international peer-reviewed journal with a wide-ranging coverage, consolidates research activities in all aspects of computational and theoretical nanoscience into a single reference source. This journal offers scientists and engineers peer-reviewed research papers in all aspects of computational and theoretical nanoscience and nanotechnology in chemistry, physics, materials science, engineering and biology to publish original full papers and timely state-of-the-art reviews and short communications encompassing the fundamental and applied research.
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