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Surface Characterization of Antireflective Thin Films

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In the visible part of the electromagnetic spectrum, a flat glass substrate reflects 8–9% of the incoming light. In some cases this reflectance is undesired in optical layer systems consisting of many individual elements. Several techniques such as magnetron sputtering, spray pyrolysis, sol–gel, and chemical vapor deposition can be used to prepare anti-reflection thin films. Main drawbacks of magnetron sputtering preparation of anti-reflection film systems on glass substrates are connected with low deposition rates and long-term stability of films. Oxides are an important class of coating materials, because they generally form chemically and environmentally stable films with a good variety of refractive indices and spectral ranges of high transmission. This article gives an overview of anti-reflection characterization of SiO2 and TiO2 multilayer thin films (deposited onto one or both sides) on flat glass substrate obtained by magnetron sputtering. Optical properties (refractive index, reflectance, transmission) were determined, and discussed in connection with surface morphology of films studied by means of atomic force microscopy (AFM). The surface roughness and anti-reflection index depends on film preparation conditions. The highest transparency (up to 96, 1%) in the range of 200 to 1100 nm was obtained for both side four layers deposited glass samples. In order to clarify the influence of environmental conditions onto properties of coatings, samples were tested in cyclic corrosion chamber (CCC). Results of present study show that environmental factors do not change quality of film surface and light reflection.
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Keywords: ANTI-REFLECTION FILM; REFLECTION; SURFACE PROPERTIES; THICKNESS OF FILM

Document Type: Research Article

Publication date: September 1, 2012

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  • Journal of Computational and Theoretical Nanoscience is an international peer-reviewed journal with a wide-ranging coverage, consolidates research activities in all aspects of computational and theoretical nanoscience into a single reference source. This journal offers scientists and engineers peer-reviewed research papers in all aspects of computational and theoretical nanoscience and nanotechnology in chemistry, physics, materials science, engineering and biology to publish original full papers and timely state-of-the-art reviews and short communications encompassing the fundamental and applied research.
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