Multiphysics Substrate Scale Modeling and Analysis of Chemical Vapor Deposition-Based Carbon Nanotube Fabrication Process

A multiphysics, multiphase model has been recently developed and utilized to study the major physical phenomena occurring inside the chemical vapor deposition (CVD) reactor chamber for a Carbon Nanotube (CNT) fabrication process. We observed that the position of the substrate significantly affected the types of CNTs formed by carbon species during surface phase reactions. However, these investigations did not include the effect of position of the substrate with respect to the inserted gas flow direction. In general, CNT formation reactions occur between the deposited metal nanoparticles on the substrate surface and gases flowing in a closed region around the substrate. Along this line, this study undertakes the investigation of several physical phenomena near the substrate in great detail. Moreover, the effects of substrate lateral displacement and ever-present angle between the substrate and the gas flow direction are investigated.