Overview of Technology Computer-Aided Design Tools and Applications in Technology Development, Manufacturing and Design
Over the past two decades, Technology Computer-Aided Design (TCAD) has played a crucial role in device research and in technology development, integration and optimization. From the earlier application to silicon technologies, TCAD has branched out into compound semiconductors and novel
materials, supporting a wide range of electronic and optoelectronic device applications. With the continued shrinking of device dimensions, TCAD is now reaching out to quantum phenomena and atomistic effects. In parallel, the rise of process-induced parametric variability in leading edge CMOS
technologies has motivated the incorporation of physics-based models into traditional Electronic Design Automation (EDA) tools, while process control methodologies in wafer manufacturing benefit from efficient Process Compact Models (PCM) derived from TCAD simulations. This paper provides
a broad overview of TCAD tools, methodologies and applications, from traditional PDE-based process and device simulation models, to state-of-the art Monte Carlo-based models, and ending with a discussion of recent applications areas for TCAD in EDA and wafer manufacturing.
Keywords: DEVICE SIMULATION; EDA; PROCESS SIMULATION; TCAD
Document Type: Review Article
Publication date: 01 June 2008
- Journal of Computational and Theoretical Nanoscience is an international peer-reviewed journal with a wide-ranging coverage, consolidates research activities in all aspects of computational and theoretical nanoscience into a single reference source. This journal offers scientists and engineers peer-reviewed research papers in all aspects of computational and theoretical nanoscience and nanotechnology in chemistry, physics, materials science, engineering and biology to publish original full papers and timely state-of-the-art reviews and short communications encompassing the fundamental and applied research.
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