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Assembly Approach for InAs Nanowire-Based Electronic Device

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This paper investigated the assembly and fabrication method for Indium Arsenide (InAs) nanowires nano devices. Assembly of InAs nanowires field-effect transistor (FET) was realized by dielectrophoresis approach. Before deposition of the contacts, InAs nanowires were treated wet etching in an ammonium polysulfide ((NH4)2S x ) solution to remove a surface oxide layer. The assembled devices were characterized by atomic force microscopy. The experimental results showed that the efficient assembly of InAs nanowires was obtained when the applied alternating current voltage has a frequency of 2 MHz and an amplitude of 10 V, and the success rate of ideal assembly for InAs nanowires FET had been assessed. Meanwhile, it also provided an effective assembly method for other one-dimensional nanomaterials assembly of nano devices.

Keywords: ASSEMBLY; DIELECTROPHORESIS; FIELD-EFFECT TRANSISTOR; INDIUM ARSENIDE

Document Type: Research Article

Publication date: 01 March 2014

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  • Journal of Advanced Microscopy Research (JAMR) provides a forum for rapid dissemination of important developments in high-resolution microscopy techniques to image, characterize and analyze man-made and natural samples; to study physicochemical phenomena such as abrasion, adhesion, corrosion and friction; to perform micro and nanofabrication, lithography, patterning, micro and nanomanipulation; theory and modeling, as well as their applications in all areas of science, engineering, and medicine.
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