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Block Copolymer Lithography as a Facile Route for Developing Nanowire-Like Arrays

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Nanowires and nanowire-like arrays have received substantial attention as a result of both their proven and potential relevance in technological applications. Among the nanowire fabrication technologies, block copolymer (BCP) lithography is currently attaining increased interest due to a number of advantages including: (a) large throughput patterning, (b) low-cost processing, (c) scalability, and d) tunable etch resistance between two or more blocks. The efficacy of BCP lithography in nanomanufacturing can be realized only after key challenges are overcome such as the ability of the polymer to wet relevant substrates, pattern perfection over macroscopic areas (for certain applications), and non-invasive procedures for pattern transfer to name a few. In this work, we demonstrate a procedure for developing nanowire-like arrays of materials with a variety of physical attributes that are emerging as candidates for modern technologies, specifically yttrium iron garnet (magnetic material), highly oriented pyrolytic graphite (carbonaceous material related to graphene), and palladium (metal).
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Document Type: Research Article

Publication date: February 1, 2011

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  • ADVANCED SCIENCE LETTERS is an international peer-reviewed journal with a very wide-ranging coverage, consolidates research activities in all areas of (1) Physical Sciences, (2) Biological Sciences, (3) Mathematical Sciences, (4) Engineering, (5) Computer and Information Sciences, and (6) Geosciences to publish original short communications, full research papers and timely brief (mini) reviews with authors photo and biography encompassing the basic and applied research and current developments in educational aspects of these scientific areas.
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