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Atomic layer deposition of metal-oxide thin films on cellulose fibers

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Atomic layer deposition (ALD) is a vapor-phase technique capable of producing inorganic thin films with precise control over the thickness of the film. The ALD method offers high precision in the design of advanced 3D nanostructures. In this article, silica and alumina thin films have been grown over fibers of cellulose by the ALD process. The morphology and the chemical composition of the fabricated thin films are characterized, as well as their thermal durability through elevated temperatures. Moreover, XPS is used to confirm the phases of the alumina nanofilms and to further understand the deposition process on the cellulose microfibers.
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Keywords: Atomic layer deposition; X-ray photoelectron spectroscopy; metal-oxides; nanomaterials; surface chemistry

Document Type: Research Article

Affiliations: 1: Department of Chemistry, The Institute for Nanotechnology, Advanced Materials Bar-Ilan University, Ramat-Gan, Israel; 2: Department of Physics, Aristotle University of Thessaloniki, Thessaloniki, Greece

Publication date: July 3, 2018

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