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Home / Critical Reviews in Solid State and Material Sciences, Volume 38, Number 3

Publisher: Taylor and Francis Ltd

Volume 38, Number 3, 1 January 2013

In Situ Studies on Reaction Mechanisms in Atomic Layer Deposition
pp. 167-202(36)
Authors: Knapas, Kjell; Ritala, Mikko

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Review on Atomic Layer Deposition and Applications of Oxide Thin Films
pp. 203-233(31)
Authors: Ponraj, Joice Sophia; Attolini, Giovanni; Bosi, Matteo

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