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Oxidation of Polymer-Derived SiAlCN Ceramics

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The oxidation behavior of polymer-derived amorphous SiAlCNs was studied in the temperature range of 900°–1200°C. The results revealed that while at 900°C the oxidation of the SiAlCNs follows typical parabolic kinetics, at higher temperatures the oxidation rates of the materials decrease with annealing time. Long-term oxidation rate of the SiAlCNs is much lower than the lowest values reported for chemical vapor deposition of SiC and Si3N4. Structures of the oxide scales were studied using solid-state nuclear magnetic resonance. We proposed that oxide scales formed for the SiAlCNs possess a unique network structure of the oxide scale in which aluminum atoms block the path of oxygen diffusion, thus lowering the oxidation rates. Such a unique structure was likely formed gradually with annealing time, leading to a continuous decrease in oxidation rate.
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Document Type: Research Article

Affiliations: 1: Advanced Materials Processing and Analysis Center, University of Central Florida, Orlando, Florida 32816 2: Laboratory of Excited State Process, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130032, China 3: Pacific Northwest National Laboratory, Richland, Washington 99352 4: Center of Interdisciplinary Magnetic Resonance, National High Magnetic Field Laboratory, Tallahassee, Florida 32310

Publication date: November 1, 2005

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