Skip to main content
padlock icon - secure page this page is secure

Coating Fine Nickel Particles with Al2O3 Utilizing an Atomic Layer Deposition-Fluidized Bed Reactor (ALD–FBR)

Buy Article:

$52.00 + tax (Refund Policy)

An atomic layer deposition–fluidized bed reactor (ALD–FBR) method has been developed to deposit ultrathin and conformal coatings on fine particles. Experiments of Al2O3 deposition on 150-μm-diameter nickel particles were conducted. The fluidized bed was constructed to operate under vacuum, and the fluidizing gas used was nitrogen. Trimethylaluminum and water were used as dosing reagents. The reactions were conducted at 450 K. Successful deposition of alumina films, with thickness controllable at the nanometer level, was observed based on transmission electron microscopy imaging, inductively coupled plasma atomic emission spectrometry, X-ray photoemission spectroscopy, particle-size distributions, and wavelength-dispersive spectrometry imaging.
No References
No Citations
No Supplementary Data
No Article Media
No Metrics

Keywords: chemical vapor deposition; coatings; films

Document Type: Research Article

Affiliations: 1: Department of Chemical Engineering, University of Colorado, Boulder, Colorado 80309 2: Department of Chemistry, University of Colorado, Boulder, Colorado 80309

Publication date: April 1, 2004

  • Access Key
  • Free content
  • Partial Free content
  • New content
  • Open access content
  • Partial Open access content
  • Subscribed content
  • Partial Subscribed content
  • Free trial content
Cookie Policy
Cookie Policy
Ingenta Connect website makes use of cookies so as to keep track of data that you have filled in. I am Happy with this Find out more