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Coating Fine Nickel Particles with Al2O3 Utilizing an Atomic Layer Deposition-Fluidized Bed Reactor (ALD–FBR)

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An atomic layer deposition–fluidized bed reactor (ALD–FBR) method has been developed to deposit ultrathin and conformal coatings on fine particles. Experiments of Al2O3 deposition on 150-μm-diameter nickel particles were conducted. The fluidized bed was constructed to operate under vacuum, and the fluidizing gas used was nitrogen. Trimethylaluminum and water were used as dosing reagents. The reactions were conducted at 450 K. Successful deposition of alumina films, with thickness controllable at the nanometer level, was observed based on transmission electron microscopy imaging, inductively coupled plasma atomic emission spectrometry, X-ray photoemission spectroscopy, particle-size distributions, and wavelength-dispersive spectrometry imaging.
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Keywords: chemical vapor deposition; coatings; films

Document Type: Research Article

Affiliations: 1: Department of Chemical Engineering, University of Colorado, Boulder, Colorado 80309 2: Department of Chemistry, University of Colorado, Boulder, Colorado 80309

Publication date: April 1, 2004

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