Control of the Kinetic Roughening in Nanostructured Ag Films by Oblique Sputter-Depositions
The roughness is a very important characteristic of a deposited film. Its control is a key issue for technological applications ranging from micro- and nano-electronics, to plasmonics, and biology. In the present work, we use oblique sputtering depositions to tune the roughness of Ag films on mica. In particular, was found to increase from 1.9 ± 0.2 to 10.2 ± 0.9 nm when the deposition angle increases from 0 to 0.84 radians (48 degrees), a regime characterized by the absence of strong shadowing effects. In this regime, the kinetic roughening was justified only on the basis of geometric factors allowing to conclude that σ ≈ σ 0 + ΔD · sin α, being σ 0 = σ(0) (the film roughness at normal deposition), and ΔD the standard deviation on the Ag nanostructures (forming the film) mean size D. This simple law was found to be in good agreement with the experimental data.
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Document Type: Short Communication
Publication date: March 1, 2012
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- Nanoscience and Nanotechnology Letters (NNL) is a multidisciplinary peer-reviewed journal consolidating nanoscale research activities in all disciplines of science, engineering and medicine into a single and unique reference source. NNL provides the means for scientists, engineers, medical experts and technocrats to publish original short research articles as communications/letters of important new scientific and technological findings, encompassing the fundamental and applied research in all disciplines of the physical sciences, engineering and medicine.
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