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Effect of Metal (Ni2+, Fe3+, and Mo3+) Doping in TiO2 Thin Films on Antimicrobial Activity

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Pure- and metal (Ni2+, Fe3+, and Mo5+)-doped TiO2 films were prepared on soda-lime-silica glass by a spin coating-pyrolysis, to be used in antimicrobial applications. As-deposited films were prefired at 500 °C for 10 min in air, followed by annealing at 550 °C for 60 min in argon. X-ray diffraction, field emissionscanning electron microscopy, and ultra-violet-visible-near infrared spectrophotometry were used to analyze the crystal structure, surface morphology, and optical properties of the films, respectively. The largest red shift in the optical-energy band gap was obtained on the Fe3+-doped TiO2 film after annealing. The number of Escherichia coli that remained after each irradiation time was counted to examine the antimicrobial ability of the films. A reduction of above 99% of Escherichia coli populations on 10 mol% Fe3+-doped TiO2 films was observed after irradiation for 40 min at 375 nm.
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Keywords: ANTIMICROBIAL ABILITY; ENERGY BAND GAP; METAL-DOPED TIO2

Document Type: Research Article

Publication date: April 1, 2017

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  • Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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