Anodic Titanium Oxide Films: Photoelectrochemical and Tribocorrosion Behavior
Titanium oxide films are fabricated by Ti anodization in orthophosphoric acid-ammonium fluoride electrolytes. On the mechanically polished semi-bright Ti substrates the continuous TiO2 films are formed, whereas ordered nanoporosity is formed on the mirror-like surface of Ti substrate at temperatures of 10–20 °C in the H3PO4 electrolyte with NH4F. The photocurrents and photopotentials are affected by the amount of fluorine in the electrolyte and consequently in the deposit. Tribocorrosion tests were performed in a neutral solution, and changes of open-circuit potential (OCP) as well as electrochemical impedance spectra were recorded with/without 0.4 N load. The rapid changes of OCP can be explained by the passive film abrasion, when oxide film becomes damaged and bare Ti surface is exposed. The wear loss depends on the NH4F concentration in the solution used for TiO2 films fabrication. TiO2 films destroyed during sliding tend to restore within 300–400 s after unloading.
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Document Type: Research Article
Publication date: April 1, 2014
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- Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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