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Chemical Vapor Deposition of Graphene on Nickel from Different Gaseous Atmospheres

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Graphene is promising for a wide range of applications due to its unique electronic and optical properties. Graphene synthesis methods should be optimized to achieve the desired characteristics of produced material. In our work we used a chemical vapor deposition method in atmosphere of a mixture of different gases (methane, argon and hydrogen) to obtain a single- or multi-layered graphene films. We have revealed an influence of argon and hydrogen concentration, as well as methane concentration (which is different because it is a carbon-containing gas) on the synthesis process and on the number of graphene layers containing in the fabricated samples.
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Keywords: ARGON; CVD; GRAPHENE; HYDROGEN; METHANE; NICKEL

Document Type: Research Article

Publication date: January 1, 2013

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  • Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
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