Analysis of a Schottky Barrier MOSFET for Synaptic Device Using Hot Carrier Injection

In this paper, we analyze the hot carrier injection (HCI) in an asymmetric dual-gate structure with a metallic source/drain. We propose a program/erase scheme where HCI occurs on the source side of the body. Owing to the large resistance of the Schottky barrier used, a large electric field is formed around the Schottky barrier. Therefore, impact ionization occurs as the gate voltage is increased and hot carriers are injected into the source side, which is less influenced by the drain voltage. We also analyze the program and erase efficiency by adjusting the Schottky barrier height or by using dopant segregation technique. We expect a small amount of current to flow and great efficiency of the program/erase operations to use as a synaptic device.