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Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications

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Spatially resolved extreme ultraviolet reflectometry is presented in application to a local characterization of thin non-uniform contamination layers. Sample reflectivity mapping is performed, demonstrating high chemical sensitivity of the technique. Amorphous Al2O3 and carbon are determined as the contaminants of the studied silicon wafer. The results correlate with those obtained by energy-filtering photoemission electron microscopy. A laboratory tool is developed that is capable of multi-angle (2°–15°) and spectrally broadband (9.5–17 nm) extreme ultraviolet reflectometry at grazing incidence combined with a reduced sample illumination spot size, enabling spatially resolved metrology. A minimum EUV spot size of 25×30 μm in the sample plane is achieved experimentally.
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Keywords: Contamination; Extreme Ultraviolet; Reflectometry; Spatial Resolution

Document Type: Research Article

Affiliations: 1: Chair for Experimental Physics of Extreme Ultraviolet, RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany 2: Chair for Technology of Optical Systems, RWTH Aachen University and JARA-FIT, Steinbachstr. 15, 52074 Aachen, Germany

Publication date: January 1, 2019

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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