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A Molecular View of Block Copolymer Directed Assembly with Solvent Vapors Simulation

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For block copolymer (BCP) lithography, solvent vapor annealing (SVA), is a well-known a low-cost, and highly efficient method used to annihilate defects in BCP thin films and to form highly ordered micro-domains within only a few minutes. In this paper, the physical process of SVA in BCPs is modeled and simulated by using a theoretical and computational approach of self-consistent field theory (SCFT) simulation with the solvent model. The impacts of the simulation parameters on the final microdomain morphologies are described and analyzed. The simulation parameters are the solvent volume fraction (f sol), polymerization degree (N), component volume fraction (f), and Flory-Huggins interaction parameter (χ). The solvent volume fraction (f sol) is a dominant factor on phase diagrams of BCP. This study can contribute to the field by greatly expanding and diversifying the range of possible applications of BCP with solvent.
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Keywords: Block Copolymer; Block Copolymer Lithography; Lithography Simulation; SCFT; Self-Consistent Field Theory; Solvent Vapor

Document Type: Research Article

Affiliations: Department of Science, Hongik University, Seoul 121-791, Korea

Publication date: 01 November 2017

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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