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Influence of Thermal Annealing on the Physical Properties of ZnO Films Grown on Si and GaAs Substrates

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We have an extensive study about the influence of thermal annealing on the physical properties of the textured grown ZnO films on Si and GaAs substrates by using rf-sputtering. The nanosized grains of ZnO films slowly increase with the increase in annealing temperature, but they abruptly increase at critical temperatures, 700 °C in the GaAs substrate and 900 °C in the Si substrate. The emission intensities at the near-band edge (NBE) of the annealed ZnO films at the critical temperatures are significantly enhanced due to donor-bound excitons. On the other hand, in the case of the ZnO film on the GaAs substrate the intermediate compounds between ZnO and GaAs are observed in the X-ray diffraction curve. The abrupt coarsening of nanosized grains, the compound formation of elements between the film and the substrate, and the rapid increase of NBE emission intensities found in the ZnO/Si and ZnO/GaAs heterostructures, annealed at the critical temperatures, are ascribed to the outdiffusion of the substrate elements Ga or As and Si into the ZnO films, respectively. It is confirmed that the high-temperature annealing above the critical temperatures causes the serious interdiffusions between the ZnO film and the Si substrate and between the ZnO film and the GaAs substrate, which collapse their heterointerfaces and expose substrate elements on the ZnO surfaces.
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Keywords: Annealing; Diffusion; ZnO

Document Type: Research Article

Affiliations: 1: Department of Nanobiotronics, Hoseo University, Asan 31499, Korea 2: Korea Photonics Technology Institute, Gwangju 61007, Korea

Publication date: 01 May 2017

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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