Effects of Metal Layer Morphology to Silicon Nanostructure Formation in Metal-Assisted Etching
This study presents a rapid and simple approach for creating silicon nanostructures using metal-assisted etching. The thickness of the metal layer was found to be a key process parameter affecting the surface morphology of silicon nanostructures. Au and Ag layers with a thickness of 3 nm, 5 nm, and 10 nm were used to study the effects of metal catalyst thickness on silicon nanostructure morphology. The experimental results show that the surface morphology of metal has a significant influence on the silicon nanostructure morphology, such that the silicon nanostructures transform from porous silicon surfaces into filament nanostructures or silicon nanowire with increasing thicknesses of both the Au and Ag metal layers.
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Document Type: Research Article
Publication date: 01 March 2012
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- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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