Formation of Fractal Structures from Silicon Dioxide Nanoparticles Synthesized by RF Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition
Fractal structures were formed on silicon substrates from SiO2 nanoparticles homogeneously synthesized in low temperature atmospheric pressure plasma from tetraethoxysilane (TEOS). RF discharge (power absorbed was about 10 W) sustained between two parallel mesh electrodes was used to generate plasma. The average size of nanoparticles was in the range of 8–20 nm and was determined by process parameters. The obtained products were analyzed by SEM (scanning electron microscopy) and XPS (X-ray photoelectron spectroscopy). Values of fractal dimension parameter of bidimensionals agglomerates formed on the substrate surface from nanoparticles were calculated with the use of Gwyddion and others. It was found that values of this parameter of the deposited structures varied in the range of 1.48–2 and were determined by combination of the process parameters. An empirical model explaining mechanism of the fractal structures formation and variation of the fractal dimension parameter with the process parameters was proposed.
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Document Type: Research Article
Publication date: 01 September 2011
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