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Nanometer Surface Roughness Effect on the Magnetic Properties of CoFeHfO Thin Films

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This article reports the effects of nanometer surface roughness on the magnetic properties of CoFeHfO thin films, as deposited on Si (100) substrates. The surface roughness was controlled via the working pressure during the sputtering time. When the working pressure increases from 0.5 to 3 mT, the surface roughness (R) of CoFeHfO thin films, formed by islands with the average high R, increases from 0.25 nm to 4.66 nm, respectively. At surface roughness (R) = 4.66 nm, coercivity (H c) reaches the highest value of 0.42 Oe and magnetic anisotropy (H k) drops to the lowest value of 33 Oe. This suggests that the quality of the soft magnetic properties of thin film decrease due to the increase in surface roughness. However, at very low working pressure, thin films become a homogeneous structure which also exhibits poor soft magnetic properties. The optimum value, with H c of 0.10 Oe and H k of 50 Oe, were obtained at 1.5 mT of working pressure. The model of the roughness effect on the magnetic properties is introduced and discussed.
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Document Type: Research Article

Publication date: January 1, 2011

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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