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591 articles with title/keywords/abstract containing semiconductor manufacturing

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Singapore Synchrotron Light Source

Author: Moser, Herbert

Source: Synchrotron Radiation News, Volume 22, Number 4, July 2009 , pp. 23-28(6)

Publisher: Taylor and Francis Ltd

Nanocrystalline TiO<SUB align=right>2 based natural dye sensitized solar cells

Authors: Jasim, Khalil Ebrahim; Hassan, Awatef M.

Source: International Journal of Nanomanufacturing, Volume 4, Numbers 1-2, 7 September 2009 , pp. 242-247(6)

Publisher: Inderscience Publishers

Route planning for two wafer fabs with capacity-sharing mechanisms

Authors: Wu, Muh-Cherng; Chen, Chen-Fu; Shih, Chang-Fu

Source: International Journal of Production Research, Volume 47, Number 20, January 2009 , pp. 5843-5856(14)

Publisher: Taylor and Francis Ltd

A Bayesian parallel site methodology with an application to uniformity modeling in semiconductor manufacturing

Authors: Fenner, Joel; Jeong, Young-Seon; Jeong, Myong; Lu, Jye-Chyi

Source: IIE Transactions, Volume 41, Number 9, September 2009 , pp. 754-763(10)

Publisher: Taylor and Francis Ltd

Variance component analysis based fault diagnosis of multi-layer overlay lithography processes

Authors: Yu, Jie; Qin, S. Joe

Source: IIE Transactions, Volume 41, Number 9, September 2009 , pp. 764-775(12)

Publisher: Taylor and Francis Ltd

Process development support environment: a tool suite to engineer manufacturing sequences

Authors: Ortloff, Dirk; Popp, Jens; Schmidt, Thilo; Bruck, Rainer

Source: International Journal of Computational Materials Science and Surface Engineerin, Volume 2, Numbers 3-4, 28 July 2009 , pp. 312-334(23)

Publisher: Inderscience Publishers

Semiconductor layered nanomaterials to encapsulate organic compounds

Author: El-Meligi, A.A.

Source: International Journal of Nano and Biomaterials, Volume 2, Numbers 1-2, 8 August 2009 , pp. 2-11(10)

Publisher: Inderscience Publishers

A study on nano-surface generation in electric discharge machining process using multi-wall carbon nanotubes

Authors: Prabhu, S.; Vinayagam, B.K.

Source: International Journal of Nanoparticles, Volume 1, Number 4, 16 June 2009 , pp. 310-326(17)

Publisher: Inderscience Publishers

Study on residual resist layer thickness measurement for Nanoimprint Lithography based on near-field optics

Authors: Takahashi, Satoru; Minamiguchi, Shuichi; Nakao, Toshiyuki; Usuki, Shin; Takamasu, Kiyoshi

Source: International Journal of Surface Science and Engineering, Volume 3, Number 3, 20 June 2009 , pp. 178-194(17)

Publisher: Inderscience Publishers

Conductivity and transparency in amorphous In-Zn-O transparent conductors

Authors: Perkins, J.D.; Hest, M.F.A.M. Van; Taylor, M.P.; Ginley, D.S.

Source: International Journal of Nanotechnology, Volume 6, Number 9, 24 June 2009 , pp. 850-859(10)

Publisher: Inderscience Publishers

The impact of product architecture on supply chain integration: a case study of Nokia and Texas Instruments

Authors: Park, YoungWon; Ogawa, Koichi; Tatsumoto, Hirofumi; Hong, Paul

Source: International Journal of Services and Operations Management, Volume 5, Number 6, 26 June 2009 , pp. 787-798(12)

Publisher: Inderscience Publishers

A review on strategic capacity planning for the semiconductor manufacturing industry

Authors: Geng, Na; Jiang, Zhibin

Source: International Journal of Production Research, Volume 47, Number 13, January 2009 , pp. 3639-3655(17)

Publisher: Taylor and Francis Ltd

Effective vehicle dispatching method minimising the blocking and delivery times in automatic material handling systems of 300 mm semiconductor fabrication

Authors: Im, Kwangyoung; Kim, Kyungsup; Park, Taeeun; Lee, Sujeong

Source: International Journal of Production Research, Volume 47, Number 14, January 2009 , pp. 3997-4011(15)

Publisher: Taylor and Francis Ltd

Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework

Authors: Chen, Liang; Ma, Mingda; Jang, Shi-Shang; Wang, David Shan-Hill; Wang, Shuqing

Source: International Journal of Production Research, Volume 47, Number 15, January 2009 , pp. 4173-4199(27)

Publisher: Taylor and Francis Ltd

Implementing virtual metrology for in-line quality control in semiconductor manufacturing

Authors: Pan, Jason Chao-Hsien; Tai, Damon HE

Source: International Journal of Systems Science, Volume 40, Number 5, May 2009 , pp. 461-470(10)

Publisher: Taylor and Francis Ltd

The management of development projects

Author: Bowers, G.H.

Source: International Journal of Technology Management, Volume 3, Number 6, 26 May 2009 , pp. 675-684(10)

Publisher: Inderscience Publishers

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