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61 articles with title/keywords/abstract containing PHOTO RESIST

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Development of Nanoparticle Fluid Imprinting Technology in Microstructure Manufacture

Authors: Weng, Y. -J.; Yang, S. -Y.

Source: Polymer-Plastics Technology and Engineering, Volume 48, Number 2, February 2009 , pp. 209-215(7)

Publisher: Taylor and Francis Ltd

Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

Authors: Shizuno, Miyako; Taniguchi, Jun; Ogino, Kenta; Ishikawa, Kiyoshi

Source: Journal of Nanoscience and Nanotechnology, Volume 9, Number 1, January 2009 , pp. 562-566(5)

Publisher: American Scientific Publishers

Generation and Characterization of Super-Hydrophobic Micro- and Nano-structured Surfaces

Authors: Mertsch, Olaf; Schondelmaier, Daniel; Rudolph, Ivo; Kutz, Oliver; Walter, Antje D.; Schleunitz, Arne; Kouba, Josef; Waberski, Christoph; Loechel, Bernd

Source: Journal of Adhesion Science and Technology, Volume 22, Number 15, 2008 , pp. 1967-1983(17)

Publisher: VSP, an imprint of Brill

A Study of an Innovative Technology for Manufacturing Optical Waveguides Based on Vacuum-Assisted Micromolding

Authors: Weng, Y. -J.; Weng, Y. -C.; Yang, S. -Y.; Huang, J. -C.; Fang, H. -S.; Wong, Y. -C.

Source: Polymer-Plastics Technology and Engineering, Volume 47, Number 11, November 2008 , pp. 1170-1173(4)

Publisher: Taylor and Francis Ltd

Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography

Authors: Chatzichristidi, M.; Rajta, I.; Speliotis, Th.; Valamontes, E.; Goustouridis, D.; Argitis, P.; Raptis, I.

Source: Microsystem Technologies, Volume 14, Numbers 9-11, October 2008 , pp. 1423-1428(6)

Publisher: Springer

Concave microlens array mold fabrication in photoresist using UV proximity printing

Authors: Lin, Tsung-Hung; Yang, Hsiharng; Chao, Ching-Kong

Source: Microsystem Technologies, Volume 13, Numbers 11-12, July 2007 , pp. 1537-1543(7)

Publisher: Springer

Forbidden pitches in sub-wavelength lithography and their implications on design

Authors: Kundu, Sandip; Sreedhar, Aswin; Sanyal, Alodeep

Source: Journal of Computer-Aided Materials Design, Volume 14, Number 1, April 2007 , pp. 79-89(11)

Publisher: Springer

Nanostructures on microstructured surfaces

Authors: Disch, Alexander; Mick, Jörg; Bläsi, Benedikt; Müller, Claas

Source: Microsystem Technologies, Volume 13, Numbers 5-6, March 2007 , pp. 483-486(4)

Publisher: Springer

A new removable resist for high aspect ratio applications

Authors: Schirmer, Matthias; Perseke, Doris; Zena, Eva; Schondelmaier, Daniel; Rudolph, Ivo; Loechel, Bernd

Source: Microsystem Technologies, Volume 13, Numbers 3-4, February 2007 , pp. 335-338(4)

Publisher: Springer

Conformal, planarizing and bridging AZ5214-E layers deposited by a 'draping' technique on non-planar III-V substrates

Authors: Eliás, P.; Strichovanec, P.; Kostic, I.; Novák, J.

Source: Journal of Micromechanics and Microengineering, Volume 16, Number 12, December 2006 , pp. 2608-2617(10)

Publisher: Institute of Physics Publishing

AFM-measured surface roughness of SU-8 structures produced by deep x-ray lithography

Authors: Vora, K.D.; Lochel, B.; Harvey, E.C.; Hayes, J.P.; Peele, A.G.

Source: Journal of Micromechanics and Microengineering, Volume 16, Number 10, October 2006 , pp. 1975-1983(9)

Publisher: Institute of Physics Publishing

Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials

Authors: Kim, Woo-Soo; Choi, Dae-Geun; Bae, Byeong-Soo

Source: Nanotechnology, Volume 17, Number 13, 14 July 2006 , pp. 3319-3324(6)

Publisher: Institute of Physics Publishing

Fluorine-Containing Polymers and the Emerging Nanotechnology

Author: John Onah, Ejembi

Source: Polymer News, Volume 30, Number 3, March 2005 , pp. 79-84(6)

Publisher: Taylor and Francis Ltd

Direct-Write Laser Exposure of Photosensitive Conductive Inks Using Shaped-Beam Optics

Authors: Corbett, Scott; Strole, Jeff; Johnston, Kyle; Swenson, Edward; Lu, Weixiong

Source: International Journal of Applied Ceramic Technology, Volume 2, Number 5, September 2005 , pp. 390-400(11)

Publisher: Blackwell Publishing

The electrochemical and electrocatalytic behaviour of glassy metals

Authors: Brookes, H.; Carruthers, C.; Doyle, T.

Source: Journal of Applied Electrochemistry, Volume 35, Number 9, September 2005 , pp. 903-913(11)

Publisher: Springer

Preparation of electron waveguide devices on GaAs/AlGaAs using negative-tone resist calixarene

Authors: Knop, M.; Richter, M.; Maßmann, R.; Wieser, U.; Kunze, U.; Reuter, D.; Riedesel, C.; Wieck, A.D.

Source: Semiconductor Science and Technology, Volume 20, Number 8, August 2005 , pp. 814-818(5)

Publisher: Institute of Physics Publishing

Synthesis of Palladium Nanoparticles Using a Continuous Flow Polymeric Micro Reactor

Authors: Yujun Song; Challa S.S.R. Kumar; Josef Hormes

Source: Journal of Nanoscience and Nanotechnology, Volume 4, Number 7, September 2004 , pp. 788-793(6)

Publisher: American Scientific Publishers

Rendering SU-8 hydrophilic to facilitate use in micro channel fabrication

Authors: Maria Nordström; Rodolphe Marie; Montserrat Calleja; Anja Boisen

Source: Journal of Micromechanics and Microengineering, Volume 14, Number 12, December 2004 , pp. 1614-1617(4)

Publisher: Institute of Physics Publishing

Plasma cleaning technology in the dual damascene process

Author: Kang T.-K.

Source: Microelectronic Engineering, Volume 71, Number 1, January 2004 , pp. 21-27(7)

Publisher: Elsevier

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