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149 articles with title/keywords/abstract containing PECVD technique

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Physico-chemical properties of SiO<SUB align=right>XN<SUB align=right>Y thin films

Authors: Mahamdi, R.; Saci, L.; Mansour, F.; Molliet, C.; Temple-Boyer, P.; Scheid, E.

Source: International Journal of Nano and Biomaterials, Volume 2, Numbers 1-2, 8 August 2009 , pp. 347-353(7)

Publisher: Inderscience Publishers

Nano surface generation of grinding process using carbon nanotube

Author: Prabhu, S.

Source: International Journal of Nanomanufacturing, Volume 3, Numbers 1-2, 13 July 2009 , pp. 15-28(14)

Publisher: Inderscience Publishers

Nanocomposite Metal Amorphous-Carbon Thin Films Deposited by Hybrid PVD and PECVD Technique

Authors: Teixeira, V.; Soares, P.; Martins, A.J.; Carneiro, J.; Cerqueira, F.

Source: Journal of Nanoscience and Nanotechnology, Volume 9, Number 7, July 2009 , pp. 4061-4066(6)

Publisher: American Scientific Publishers

Morphological Observation of Y and T Junctions in Nanostructured Boron Nitride Thin Films

Authors: Kumar, Sushil; Parashar, A.; Rauthan, C.M.S.; Singhal, S.K.; Dixit, P.N.; Singh, B.P.; Bhattacharyya, R.

Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 7, July 2008 , pp. 3526-3531(6)

Publisher: American Scientific Publishers

Large Storage Window in a-SiNx/nc-Si/a-SiNx Sandwiched Structure for Nanocrystalline Silicon Floating Gate Memory Application

Authors: Xiang, Wang; Jian, Huang; Hong-Lin, Ding; Xian-Gao, Zhang; Lin-Wei, Yu; Xin-Fan, Huang; Wei, Li; Kun-Ji, Chen

Source: Chinese Physics Letters, Volume 25, Number 7, July 2008 , pp. 2690-2693(4)

Publisher: Institute of Physics Publishing

High Pressure Growth of Nanocrystalline Silicon Films

Authors: Kumar, Sushil; Gope, Jhuma; Kumar, Aravind; Parashar, A.; Rauthan, C.M.S.; Dixit, P.N.

Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 8, August 2008 , pp. 4211-4217(7)

Publisher: American Scientific Publishers

Luminescence Tuning of Amorphous Si Quantum Dots Prepared by Plasma-Enhanced Chemical Vapor Deposition

Authors: Kang, S.M.; Yoon, S.G.; Kim, S.W.; Yoon, D.H.

Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 5, May 2008 , pp. 2540-2543(4)

Publisher: American Scientific Publishers

Mechanical Properties Measurement of PECVD Silicon Nitride after Rapid Thermal Annealing Using Nanoindentation Technique

Authors: Yan, H.-Y.; Ou, K.-S.; Chen, K.-S.

Source: Strain, Volume 44, Number 3, June 2008 , pp. 259-266(8)

Publisher: Blackwell Publishing

Secondary Nanotube Growth on Aligned Carbon Nanofibre Arrays for Superior Field Emission

Authors: Watts, Paul C.P.; Lyth, Stephen M.; Henley, Simon J.; Ravi, S.; Silva, P.

Source: Journal of Nanoscience and Nanotechnology, Volume 8, Number 4, April 2008 , pp. 2147-2150(4)

Publisher: American Scientific Publishers

Study of Thin Polymeric Film Deposited by the PECVD Process for use at 193 nm

Authors: Cazeca, Mario; Nagarajan, Ramaswamy; Sheu, Min-Shyan; Gow, Max; Comptois, Cecil; Sabnis, Ram; Farnsworth, Ashley

Source: Journal of Macromolecular Science, Part A: Pure and Applied Chemistry, Volume 44, Number 12, December 2007 , pp. 1317-1322(6)

Publisher: Taylor and Francis Ltd

Single- and Few-Walled Carbon Nanotubes Grown at Temperatures as Low as 450 °C: Electrical and Field Emission Characterization

Authors: Gohier, A.; Djouadi, M.A.; Dubosc, M.; Granier, A.; Minea, T.M.; Sirghi, L.; Rossi, F.; Paredez, P.; Alvarez, F.

Source: Journal of Nanoscience and Nanotechnology, Volume 7, Number 9, September 2007 , pp. 3350-3353(4)

Publisher: American Scientific Publishers

DC and microwave performance of AlGaN/GaN HEMTs passivated with sputtered SiNx

Authors: Shiu, J.Y.; Desmaris, V.; Rorsman, N.; Kumakura, K.; Makimoto, T.; Zirath, H.; Chang, E.Y.

Source: Semiconductor Science and Technology, Volume 22, Number 7, July 2007 , pp. 717-721(5)

Publisher: Institute of Physics Publishing

Influence of Silicon, Oxygen and Nitrogen Admixtures Upon the Properties of Plasma Deposited Amorphous Diamond-Like Carbon Coatings

Authors: Buršíková, Vilma; Zajíčková, Lenka; Dvořák, Pavel; Valtr, Miroslav; Buršík, Jiří; Bláhová, Olga; Peřina, Vratislav; Janča, Jan

Source: Journal of Advanced Oxidation Technologies, Volume 9, Number 2, July 2006 , pp. 232-236(5)

Publisher: Science and Technology Network Inc.

Asymmetrical single-mode silica waveguide deposited by PECVD

Authors: Kim, Y.; Yoon, S.; Yoon, D.

Source: Journal of Electroceramics, Volume 17, Numbers 2-4, December 2006 , pp. 311-314(4)

Publisher: Springer

Photoconductivity of TiO2 films deposited by PECVD

Authors: Kolouch, A.; Hájková, P.; Špatenka, P.; Heyduková, E.; Exnar, P.

Source: Czechoslovak Journal of Physics, Volume 56, Supplement 1, October 2006 , pp. B1237-B1243(1)

Publisher: Springer

Transport studies of carbon-rich a-SiC x :H film through admittance and deep-level transient spectroscopy measurements

Authors: Atilgan, I.; Ozdemir, O.; Akaoglu, B.; Sel, K.; Katircioglu, B.

Source: Philosophical Magazine, Volume 86, Number 19, 1 July 2006 , pp. 2771-2796(26)

Publisher: Taylor and Francis Ltd

Corrosion protection and mechanical performance of SiO2 films deposited via PECVD on OT59 brass

Authors: Moretti, Giuseppe; Guidi, Francesca; Canton, Roberto; Battagliarin, Marino; Rossetto, Gilberto

Source: Anti-Corrosion Methods and Materials, Volume 52, Number 5, 2005 , pp. 266-275(10)

Publisher: Emerald Group Publishing Limited

Optoelectronic properties of hydrogenated amorphous germanium deposited by rf-PECVD as a function of applied rf-power

Authors: Bouizem, Y.; Sib, J.D.; Kebab, A.; Chahed, L.; Belfedal, A.

Source: Journal of Physics: Condensed Matter, Volume 17, Number 33, 24 August 2005 , pp. 5149-5158(10)

Publisher: Institute of Physics Publishing

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