Superhard Nanocrystalline Titanium Nitride Films Formed by Inductively Coupled Plasma-Assisted Sputtering
Nano fabrication technology of superhard TiN films with sub-nanometered crystallites was developed using an Inductively coupled plasma (ICP) during deposition. Nanocrystalline TiN coatings were fabricated by ICP assisted sputtering and the properies of the coatings were investigated.
The ICP assisted TiN coatings showed a much higher nano-hardness (>43 GPa) compared to coatings produced by the conventional DC sputtering process. The ICP assisited TiN coatings also showed superior properties in dense microstructure and surface roughness compared to the DC sputtered TiN
coatings. The superior mechanical properties of ICP assistted TiN coatings were attributed to the fine and dense microstructure and high compressive residual stress.
Keywords: ICP ASSISTED SPUTTERING; INDUCTIVELY COUPLED PLASMA; TIN
Document Type: Research Article
Publication date: 01 August 2011
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
- Editorial Board
- Information for Authors
- Subscribe to this Title
- Terms & Conditions
- Ingenta Connect is not responsible for the content or availability of external websites
- Access Key
- Free content
- Partial Free content
- New content
- Open access content
- Partial Open access content
- Subscribed content
- Partial Subscribed content
- Free trial content