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Wavy Polymer Thin Film Fabrication Using Sintered Monolayered Colloids

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Thin films of polystyrene were prepared onto flexible prestrained substrates using a convective colloidal assembly in monolayer fashion followed by thermal annealing at 150, and 160 °C. The prestrained substrate was under a tensile stress which was subsequently released resulting in wavy polymer thin films. By controlling the prestrain, the released stress was varied and the geometry of the resulting wavy patterns was tuned. Wavelength and amplitude values showed strong correlation with theoretical expectations. In addition to the uniaxial mechanical strain, thermal strain was also present in the experimental conditions; however, the resulting wavy patterns show no evidence of being affected by the isotropic thermal strain in our experimental model.

Keywords: COLLOIDS; CONVECTIVE ARRAY; MONOLAYER ARRAY; POLYMER; WAVY STRUCTURE

Document Type: Research Article

Publication date: 01 August 2010

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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