A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering
Authors: Tay, Cho Jui; Quan, Chenggen
Source: Optik International Journal for Light and Electron Optics, Volume 114, Number 1, 1 April 2003 , pp. 1-6(6)
Publisher: Urban & Fischer
Abstract:A technique for measuring surface roughness of semi-conductor wafers in the nanometer range has been developed. The principle of the method is based on laser scattering from a rough surface. A tele-centric optical set-up is constructed to illuminate the test specimens and the scattered light field is recorded with a photo-diode sensor connected to a digital amplifier. A parametric method is proposed for the evaluation technique and results obtained are compared with those obtained using a conventional Taylor Hobson mechanical stylus profilometer. A set of roughness standards fabricated in accordance with BS 2634 and ISO 2632 is employed in the calibration process.
Document Type: Research Article
Affiliations: Department of Mechanical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
Publication date: 2003-04-01