Photoresist reflow method of microlens production Part II: Analytic models
Authors: O'Neill, F.T.; Sheridan, J.T.
Source: Optik International Journal for Light and Electron Optics, Volume 113, Number 9, November 2002 , pp. 405-419(15)
Publisher: Urban & Fischer
Abstract:In this paper attempts to model microlens surface profiles are discussed. The models used are analytic models. These models are examined for a range of different f numbers, f/#, and used to fit the experimental data discussed in the previous paper, Part I. A comparison of the models is made and the predicated aberrations are calculated. The estimated aberrations are also compared to experimental results previously published in the literature.
Document Type: Original Article
Affiliations: Department of Electronic and Electrical Engineering, University College Dublin, Belfield, Dublin 4, Republic of Ireland
Publication date: November 1, 2002