Photoresist reflow method of microlens production Part II: Analytic models

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Abstract:

In this paper attempts to model microlens surface profiles are discussed. The models used are analytic models. These models are examined for a range of different f numbers, f/#, and used to fit the experimental data discussed in the previous paper, Part I. A comparison of the models is made and the predicated aberrations are calculated. The estimated aberrations are also compared to experimental results previously published in the literature.

Keywords: Microlens; curvature; modelling; photoresist

Document Type: Original Article

DOI: http://dx.doi.org/10.1078/0030-4026-00187

Affiliations: Department of Electronic and Electrical Engineering, University College Dublin, Belfield, Dublin 4, Republic of Ireland

Publication date: November 1, 2002

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