Photoresist reflow method of microlens production Part II: Analytic models

Authors: O'Neill, F.T.; Sheridan, J.T.

Source: Optik – International Journal for Light and Electron Optics, Volume 113, Number 9, November 2002 , pp. 405-419(15)

Publisher: Urban & Fischer

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Abstract:

In this paper attempts to model microlens surface profiles are discussed. The models used are analytic models. These models are examined for a range of different f numbers, f/#, and used to fit the experimental data discussed in the previous paper, Part I. A comparison of the models is made and the predicated aberrations are calculated. The estimated aberrations are also compared to experimental results previously published in the literature.

Keywords: Microlens; curvature; photoresist; modelling

Document Type: Original article

DOI: http://dx.doi.org/10.1078/0030-4026-00187

Affiliations: 1: Department of Electronic and Electrical Engineering, University College Dublin, Belfield, Dublin 4, Republic of Ireland

Publication date: 2002-11-01